Triclinic-structure composite oxide containing zinc and tungsten and phosphor

ABSTRACT

There are provided a composite oxide of triclinic crystal system comprising zinc and tungsten, and a production method thereof. Further, there is provided a light-emitting material comprising the composite oxide of triclinic crystal system comprising zinc and tungsten.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a triclinic-structure composite oxide composed of zinc and tungsten, in particular, a phosphor widely used as a scintillation plate for detecting radiation such as electron beam and X ray and as various display devices.

2. Description of the Related Art

The tungstates (MnWO₄, CoWO₄, NiWO₄, MgWO₄, CdWO₄, MnWO₄ and the like) represented by a general formula XWO₄ are widely used as optical materials such as scintillator materials and laser materials. Among these tungstates, particularly ZnWO₄ where X=Zn is an optical material having a monoclinic structure referred to as SANMARTINITE in which a tungsten atom is bonded to six oxygen atoms to form an octahedron. Its emission spectrum exhibits a broad blue-green light emission with a peak around 500 nm. This monoclinic system is the only one structure represented by the formula ZnWO₄.

SUMMARY OF THE INVENTION

An object of the present invention is to provide a composite oxide of a novel crystal structure comprising zinc and tungsten, to be used as a light-emitting material to be excited by electron beam, X ray and ultraviolet light, and a production method thereof.

The present invention relates to a composite oxide of triclinic crystal system comprising zinc and tungsten. As the composite oxide, particularly a composite oxide represented by the chemical formula ZnWO₄ is preferably used. However, the composite oxide of the present invention is not limited to ZnWO₄, and is represented by a general formula Zn_(X)W_(2−X)O₄ and can form a triclinic zinc tungstate within a range of 0.5≦X>1.5. Such a composite oxide comprising zinc and tungsten is used as a light-emitting material.

It is preferable that the light-emitting material of the present invention has a structure in which a particular crystal plane of the triclinic zinc tungstate crystal is grown approximately parallel to a substrate (i.e., a surface of a substrate) Incidentally, the term “approximately parallel” herein employed is intended to include not only the case where the crystal plane is parallel to the substrate but also the case where the crystal plane has an inclination with respect to the substrate but can be regarded as substantially parallel to the substrate. Similarly, the term “approximately perpendicular” herein employed is intended to include not only the case where the crystal plane is perpendicular to the substrate but also the case where the crystal plane has an inclination with respect to the substrate but can be regarded as substantially perpendicular to the substrate.

As the above-mentioned crystal plane, the (01-1) plane is included, but the above-mentioned crystal may have a structure in which the (001) plane or (0-10) plane is grown approximately parallel to the substrate.

Further, it is preferred that the light-emitting material has a columnar structure which extends in a direction approximately perpendicular to the substrate. When the light-emitting material has such a columnar structure, light can be extracted approximately in the longitudinal direction of the columnar structure. Moreover, when detecting the light with two-dimensionally arranged photodetectors, the resolution can be improved.

The sectional shape in the direction parallel to the substrate of the columnar structure is preferably such that when the sectional shape is converted into a circle (referred to as “area-equivalent circle”) having the same sectional area as that of the sectional shape of the columnar structure, the average value of the diameter of the circle falls within the range of 50 nm or more and 500 nm or less. The reason for limiting to the range of 50 nm or more and 500 nm or less is that when the diameter of the columnar structure is markedly smaller or excessively larger than the wavelength of generated light, the generated light is not scattered efficiently at the interface of the columnar structure and hence the efficiency of extraction of light to the outside is lowered Further, it is also preferable that the film thickness of the columnar structure is 5 μm or less. The reason for limiting to 5 μm or less is that when the film thickness is too large, light generated at a position distant from the light extraction surface cannot be extracted to the outside because of the absorption and scattering within the film.

The present invention also provides a production method in which the above-mentioned light-emitting material is formed on a substrate by means of a sputtering method. The present invention also provides a light-emitting device and a radiation scintillator using the above-mentioned phosphor, in particular, an inorganic EL element, an organic/inorganic composite light-emitting device, a fluorescent thin film for FED and a radiation scintillator.

According to the present invention, there can be obtained a composite oxide of triclinic crystal system comprising zinc and tungsten. The above-mentioned material shows a green light emission with a peak at 530 nm, and can be used as a light-emitting material which shows emission of a green color higher in purity as compared to a conventional single-crystalline ZnWO₄ which has an emission peak at 500 nm. The material can be used for a light-emitting material widely used as a scintillation plate for detecting radiation such as electron beam and X ray, and as various display devices.

Further features of the present invention will become apparent from the following description of exemplary embodiments with reference to the attached drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a schematic view showing a columnar light-emitting material of the present invention.

FIG. 2 is a schematic diagram showing a film preparation method of the present invention.

FIG. 3 is a schematic view showing a crystal structure formed in the film preparation method of the present invention.

FIG. 4 is a graphical representation showing a result of X ray diffraction of region A-1 of the present invention.

FIG. 5 is a graphical representation showing a result of X ray diffraction of region A-2 of the present invention.

FIG. 6 is a graphical representation showing a result of a cathode luminescence measurement of the region A-1 of the present invention.

FIG. 7 is a schematic view showing the configuration of a light-emitting device of the present invention.

FIG. 8 is a schematic diagram illustrating a method of obtaining a diameter by converting a sectional shape of a microcrystal into a circular shape.

FIG. 9 is a sectional view of a radiation detector in which a radiation scintillator panel is bonded to a sensor panel having a plurality of photosensors and TFTs disposed thereon.

FIG. 10 is a TEM (transmission electron microscope) photograph showing a section of a columnar crystal.

DESCRIPTION OF THE EMBODIMENTS

Here are described embodiments of the present invention.

First Embodiment

In the present embodiment, description is made with reference to FIGS. 1, 2, 3, 4, 5 and 6 on an example in which five phosphors of triclinic crystal system having a chemical formula represented by ZnWO₄ were fabricated by using a sputtering method.

FIG. 1 is a schematic view showing a thin film phosphor fabricated in the present embodiment. The fabrication steps therefor are presented below.

ZnO and WO₃ were simultaneously sputtered on a silicon substrate set at a substrate temperature of 600° C. by means of a RF sputtering method by using ZnO and WO₃ as targets to form a fluorescent thin film having a thickness of approximately 700 nm. FIG. 2 shows the positional relationship between the targets and the substrate holder at that time. As the targets, a ZnO target and a WO₃ target each of 2 inches in diameter were used, and as the substrate a silicon substrate was used. The incident directions to the two targets were offset by 120° with respect to each other, the targets were inclined by 20° with respect to the direction perpendicular to the substrate, the intersection between normals from the centers of the respective target surfaces is located at a position which is offset upwardly with respect to the center of the substrate, the distance between the substrate and each of the targets was set to 70 mm, the output power for each of the targets was set to 150 W, and the film formation was carried out for 40 minutes.

The region within the substrate holder was divided into four regions shown in FIG. 3, and a 1-inch silicon substrate was placed in each of the regions and film formation was performed. The crystal structures formed in the respective regions are described below.

<Regions A-1 and A-2>

The formed films were irradiated with ultraviolet light and fluorescence observation was performed, with the result that both the region A-1 and the region A-2 showed green light emission. The result of in-plane X ray diffraction of the region A-1 is shown in FIG. 4, and the result of in-plane X ray diffraction of the region A-2 is shown in FIG. 5. Characteristic peaks that were not able to be identified in the monoclinic ZnWO₄ appeared at low angles (2θ=13.5, 14.6). By means of transmission electron microscopy analyses it was revealed that the crystal systems in the regions A-1 and A-2 were triclinic ZnWO₄ crystals as a novel structure.

Here, the compositions of the above-mentioned crystals are not limited to ZnWO₄, but the triclinic zinc tungstate of the present invention can be formed for the system represented by the general formula Zn_(X)W_(2-X)O₄ wherein X falls within the range of 0.5≦X≦1.5. Because the region A was closer to the ZnO target, the triclinic Zn_(X)W_(2−X)O₄ fell within a region of 1.0<X<1.5. In the X ray analysis results shown in FIGS. 4 and 5, all the peaks were able to be identified on the basis of the assumption that the crystals were triclinic ZnWO₄ crystals. The three intense peaks shown in FIG. 4 were assigned to the (01-1), (02-2), and (03-3) peaks of the triclinic ZnWO₄, respectively, revealing that the (01-1) crystal plane is oriented with respect to the substrate. Further, by performing film formation while changing the positional relationship between the substrate and the targets and the conditions such as the substrate temperature, there can be obtained a structure in which (001) plane or (0-10) plane is grown parallel to the substrate.

Additionally, the plane structure and the sectional structure of the region were observed by transmission electron microscopy, and consequently it was confirmed that, as shown in FIG. 1, the structure was composed of an aggregate of columnar crystals of approximately 60 nm in diameter; and also from the result of electron beam diffraction, it was confirmed that the columnar crystals were oriented.

The respective peaks of the X ray diffraction pattern shown in FIG. 5 were able to be identified as the peaks of the triclinic ZnWO₄; the plane structure and the sectional structure were observed by transmission electron microscopy, and it was confirmed that the structure was composed of an aggregate of microcrystals of approximately 60 nm in diameter; and also from the result of electron beam diffraction, it was confirmed that the microcrystals were not oriented. For the evaluation of the size of the microcrystals, on the basis of the crystal sectional shape as shown in FIG. 10, a microcrystal sectional shape was converted into a circle in a manner as shown in FIG. 8 (here, a hexagonal shape is depicted, but the actual shape is not particularly limited) and thus, the diameter d of the circle was calculated (the solid lines in FIG. 10 indicate the diameters of circles obtained by the conversion); the d values thus obtained for the microcrystals were averaged. Consequently, the average value of the diameters of the circles obtained by the conversion was found to be 60 nm. FIG. 10 is a TEM (transmission electron microscope) photograph showing the section.

The shape of a section in the direction parallel to the substrate of the columnar structure is preferably such that when the shape is converted into a circle having the same area as that of the shape, the diameter of the circle falls within the range from 50 nm to 500 nm on average.

FIG. 6 shows the result of measurement of cathode luminescence for a thin film made in the region A-1 with 80 keV electron beam irradiation in a transmission electron microscope. The emission spectrum had a peak around 530 nm and was found to be shifted to the longer wavelength side as compared to the monoclinic ZnWO₄.

<Region B>

The structure obtained was such that the two crystals, namely, triclinic ZnWO₄ crystal of the present invention and monoclinic ZnWO₄ crystal (SANMARTINITE) were mixed with each other. Observation of fluorescence by ultraviolet irradiation gave a blue light emission.

<Region C>

In addition to monoclinic ZnWO₄ crystal (SANMARTINITE), WO₃ was deposited because of the proximity of the region C to the WO₃ target. Observation of fluorescence by ultraviolet irradiation gave a blue light emission resulting from the monoclinic ZnWO₄ crystal.

As described above, the use of the present production method has made it possible to fabricate the triclinic ZnWO₄ crystal that is a novel crystal system, as a crystal structure represented by the formula ZnWO₄. Additionally, the present production method has also made it possible, in a special case, to fabricate a thin film light-emitting material having a structure in which a specific crystal plane of the triclinic ZnWO₄ crystal is grown parallel to the substrate.

The film thickness of the triclinic ZnWO₄ crystal is preferably set to be 5 μm or less. This is because when the film thickness becomes too large, light generated at a position distant from the light extraction surface cannot be extracted to the outside because of absorption and scattering within the film.

Second Embodiment

The present embodiment is another embodiment in which a sputtering method was used to fabricate triclinic ZnWO₄ crystals oriented with respect to a substrate.

A 1-μm thick ZnWO₄ film was formed on a 4-inch silicon substrate by using a target having a compositional ratio ZnO:WO₃ adjusted to 1.2:1 at a substrate temperature of 600° C. with a RF sputtering method. The X ray diffraction analysis of the thus formed film revealed that, in the whole region of the substrate, the film was formed of triclinic ZnWO₄ crystal. Additionally, when the plane structure and the sectional structure were observed by transmission electron microscopy, the structure was such that columnar crystals of approximately 100 nm in diameter were aggregated and oriented with respect to the substrate, as is the case with first embodiment.

Third Embodiment

In the present embodiment, an example of the fabrication of a light-emitting device using triclinic ZnWO₄ in a light-emitting portion thereof is described. FIG. 7 is a sectional view showing the light-emitting device of the present example fabricated by a sequence of steps. Description is made below on the steps sequentially

A transparent electrode 72 was formed as a film on a transparent substrate 71, and thereafter a dielectric thick film 73 was formed thereon. Then, by using a target having a compositional ratio ZnO:WO₃ adjusted to 1:1 by volume, a 1-μm thick ZnWO₄ film 74 was formed at a substrate temperature of 600° C. with a RF sputtering method. Then, another dielectric thick film 75 was formed thereon, and finally an electrode 76 was formed thereon.

Subsequently, when a 1-kHz AC voltage was applied in a gradually increasing manner between the transparent electrode 72 and the electrode 76, a green light emission started to be observed at about 100 V.

Fourth Embodiment

The application of the present invention as a radiation scintillator in a radiation imaging system is made possible by combining triclinic ZnWO₄ which emits light by irradiation with a radiation and photodetectors for detecting the generated light and converting the light into an image (electric signals). As the photodetectors, a one-dimensionally or two-dimensionally arranged sensor panel can be used. For example, when used as an imaging system for a transmission electron microscope, the imaging system is constituted by a scintillation plate formed of triclinic ZnWO₄, a bundle of optical fibers as an optical waveguide, and photo detectors (CCDs).

Moreover, there can be used, as a sensor panel, one in which TFTs made of amorphous silicon serving as switching elements, and pixels formed of PIN-type or MIS-type photodetectors are one-dimensionally or two-dimensionally arranged on an insulating substrate. A radiation detector can be constructed by bonding to each other, with an adhesive, a radiation scintillator formed of triclinic ZnWO₄ which emits light by irradiation with a radiation and such a sensor panel. Further, triclinic ZnWO₄ which emits light by irradiation with a radiation can be stacked directly on a sensor panel.

FIG. 9 is a sectional view of a radiation detector in which a radiation scintillator panel 110 bonded to a sensor panel 100 in which a plurality of pixels each composed of a photodetector element (photoelectric conversion element) and a TFT are disposed two-dimensionally. In FIG. 9, reference numeral 101 denotes a glass substrate, 102 denotes a photoelectric conversion element composed of a photodetector element using amorphous silicon and a TFT, and 103 denotes a wiring portion. Additionally, 104 denotes an electrode take-out portion, 105 denotes a first protective layer formed of silicon nitride or the like, and 106 denotes a second protective layer formed of a resin film or the like. Additionally, 111 denotes a supporting substrate, 114 denotes a reflecting layer, 115 denotes an underlying layer, 112 denotes a phosphor layer composed of columnar phosphors, and 113 denotes a moisture-resistant protective layer formed of an organic resin or the like. The two-dimensional photodetector 100 is constituted by 101 to 106, and the scintillator panel 110 is constituted by 111 to 115 Reference numeral 121 denotes an adhesive layer formed of a transparent adhesive, and 122 denotes a sealing (or encapsulating) portion. As described above, the photodetector (sensor panel) 100 and the scintillator panel 110 are bonded to each other with the interposition of the adhesive layer 121 to provide a radiation detector. The photodetectors and the TFTs in the photoelectric conversion element portion have the same layer configuration, which is disclosed, for example, in Japanese Patent No. 3066944.

The photodetectors in the photoelectric conversion element portion may be disposed on the TFTs with the interposition of an insulating layer, and may be connected thereto through contact holes.

The present invention is applied to a phosphor widely used as a scintillation plate to detect radiation such as electron beam and X ray and as various display devices.

While the present invention has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the disclosed exemplary embodiments. The scope of the following claims is to be accorded the broadest interpretation so as to encompass all such modifications and equivalent structures and functions.

This application claims the benefit of Japanese Patent Application No. 2005-353491, filed Dec. 7, 2005, which is hereby incorporated by reference herein in its entirety. 

1. A composite oxide of triclinic crystal system comprising zinc and tungsten.
 2. The composite oxide according to claim 1, wherein the composite oxide is represented by a chemical formula of ZnWO₄.
 3. A phosphor using the composite oxide set forth in claim 1 as a light-emitting material.
 4. The phosphor according to claim 3, having a structure in which a specific crystal plane of the triclinic crystal as the light-emitting material is grown approximately parallel to a substrate.
 5. The phosphor according to claim 3, wherein the light-emitting material has a columnar structure extending in a direction approximately perpendicular to a substrate.
 6. The phosphor according to claim 5, wherein the shape of a section parallel to the substrate of the columnar structure is such that when the sectional shape is converted into a circle having the same area as the area of the sectional shape, the diameter of the circle falls, on average, within the range from 50 nm to 500 nm.
 7. The phosphor according to claim 5, wherein the film thickness of the columnar structure is 5 μm or less.
 8. A light-emitting device comprising the phosphor set forth in claim 3 and a pair of electrodes for applying an electric field to the phosphor.
 9. A radiation scintillator using the phosphor set forth in claim
 3. 10. A radiation detector, comprising the radiation scintillator set forth in claim 9 and a sensor panel having a photodetector element for converting light from the radiation scintillator to an electric signal.
 11. A method of producing a film comprising a triclinic crystal by using a sputtering method, comprising the steps of: disposing a substrate and a target in such a way that a first axis in a direction approximately perpendicular to a surface of the substrate and a second axis in a direction approximately perpendicular to a surface of the target intersect each other; and forming a film comprising the material of the target on the substrate.
 12. The method according to claim 11, wherein an angle formed between the first axis and the second axis is approximately 20°.
 13. The method according to claim 11, wherein the target is disposed in plurality.
 14. The method according to claim 11, wherein the film comprising the triclinic crystal comprises ZnWO₄ crystal. 